This book describes up-to-date technology applied to high-Kmaterials for More Than Moore applications, i.e. microsystemsapplied to microelectronics core technologies.
After detailing the basic thermodynamic theory applied to high-Kdielectrics thin films including extrinsic effects, this bookemphasizes the specificity of thin films. Deposition and patterningtechnologies are then presented. A whole chapter is dedicated tothe major role played in the field by X-Ray Diffractioncharacterization, and other characterization techniques are alsodescribed such as Radio frequency characterization. An in-depthstudy of the influence of leakage currents is performed togetherwith reliability discussion. Three applicative chapters coverintegrated capacitors, variables capacitors and ferroelectricmemories. The final chapter deals with a reasonably new researchfield, multiferroic thin films.