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A Borderland between STM, EB, IB, and X-Ray Lithographies

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Proceedings of the NATO Advanced Research Workshop, Frascati, Roma, Italy, April 6--8, 1993


Titel: Nanolithography
Autoren/Herausgeber: M. Gentili, Carlo Giovannella, Stefano Selci (Hrsg.)
Aus der Reihe: NATO Science Series E
Ausgabe: Softcover reprint of hardcover 1st ed. 1994

ISBN/EAN: 9789048143887

Seitenzahl: 216
Format: 23,5 x 15,5 cm
Produktform: Taschenbuch/Softcover
Gewicht: 355 g
Sprache: Englisch

Success in the fabrication of structures at the nanometer length scale has opened up a new horizon to condensed matter physics: the study of quantum phenomena in confined boxes, wires, rings, etc. A new class of electronic devices based on this physics has been proposed, with the promise of a new functionality for ultrafast and/or ultradense electronic circuits. Such applications demand highly sophisticated fabrication techniques, the crucial one being lithography. Nanolithography contains updated reviews by major experts on the well established techniques -- electron beam lithography (EBL), X-ray lithography (XRL), ion beam lithography (IBL) -- as well as on emergent techniques, such as scanning tunnelling lithography (STL). - Newsletter
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